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A photomask is comprised of a solid, transparent substrate, such as glass or fused silica, showing an opaque coating on one of the ...

A hard defect is any flaw affecting the photomask mask, other than contamination. One class of defects includes ...

A hard defect is any flaw affecting the photomask mask, other than contamination. One class of defects includes ...

Photomask photo resist development is a critical step in photo resist processing because it plays a key role in defining ...

The writing equipment writes the geometry onto the blank mask plate by exposing the photo resist to a UV light source, a laser or an electron beam ...

Data preparation includes all of the steps that are required to insure that data is ready for the write ...

Of the three intermediate data formats, CIF data is the format least used by mask ...

The steps involved in a typical photomask writing and development process using ...

Photomasks must be of the highest quality and must meet a wide variety of customer specifications. The photomask quality requirements are usually ...

There are two most common types of substrate material used for making photomasks are quartz (fused silica) and Soda Lime ...

Photomasks can be separated into two main categories; conventional binary masks and advanced phase-shift masks. A binary mask consists of a ...

Various terminologies are used to describe the tone of both pattern and background areas of a photomask.

A technical glossary of terms used in photomask manufacturing.

With the photomask market on the rise each year, the importance of finding a quality photomask manufacturer you can trust is more important than ever. We pull together a list of the top photomask manufacturers from ...